Mass manufacturing of metasurfaces
The mass production of flat optical devices with sub-wavelength structures could soon be a reality, thanks to a metasurface fabrication technique developed by researchers at A*STAR.
The mass production of flat optical devices with sub-wavelength structures could soon be a reality, thanks to a metasurface fabrication technique developed by researchers at A*STAR.
Optics & Photonics
Mar 18, 2019
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Nano-electronics research center Imec and Nova Measuring Instruments, a leading innovator and key provider of metrology solutions for advanced process control used in semiconductor manufacturing, announced today at SPIE advanced ...
Electronics & Semiconductors
Feb 23, 2016
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(Phys.org) —ASML develops technology for high-tech lithography machines for the semiconductor industry. The company, based in The Netherlands, manufactures equipment that is used to transfer circuit patterns onto wafers. ...
Imec today announces the world-first realization of functional sub-100nm photonics components with optical lithography on 300mm silicon photonics wafer technology. Using 193nm immersion lithography, imec achieved the lowest ...
Electronics & Semiconductors
Jul 10, 2012
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Imec and ASML collaborated to qualify ASML's Tachyon Source Mask Optimization and programmable illuminator system FlexRay, proving its potential with the demonstration of a 22nm SRAM memory cell.
Electronics & Semiconductors
Jul 14, 2010
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Toshiba and Japan's National Institute of Advanced Industrial Science and Technology (AIST) today announced joint development of a mask pattern optimizing technology that improves the accuracy of lithography for LSIs by approximately ...
Electronics & Semiconductors
Feb 15, 2010
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